XL5D0217-2 (4)

My research interests include:

  • Interface and oxide characterization

  • Surface/interface passivation

  • Radiation effect study, and radiation hardening

  • Emerging memory study such as RRAM and HfO2 ferroelectrics

  • Novel unipolar logic circuit

 

I  received my Bachelor degree on Microelectronics and Solid-State Physics from Peking University in 2008, with my undergraduate research on Reisistive Switching Memory. Then, I went to Yale University at Prof. T. P. Ma group, and received my PhD degree in Electrical Engineering in 2013. My doctoral thesis topic is “Characterizations of High k Dielectrics on III-V Based MOSFETs.” From Jul 2010 to Jan 2011, I also worked in IMEC at Leuven, Belgium as a visiting scholar benchmarking high-k dielectrics on III-V and Ge substrates. In 2011 summer, I worked in IBM 14nm FinFET group at Albany with a focus on ultra-small FinFET characterization. I am  grateful to collaborate with a few institutions and universities in my research, including MIT, UC-Berkeley, UT-Austin, Vanderbilt, Purdue, IMEC, CEA-LETI, Soitech, TSMC and IBM. I have received IBM PhD fellowship for two consecutive years, and visiting scholar fellowship from K. U. Leuven in Belgium. I also serve as a reviewer for IEEE journals and Applied Physics Letters.

 

For more information, please see my Curriculum Vitae

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